Scientific Production Faculty

Influence of the Temperature on the Diffusion Coefficient Value during the Cobalt Electrodeposition on Different Substrates.



Mendoza Huizar, Luis Humberto

2014

Nancy Ramos Lora, Luis Humberto Mendoza Huizar, Clara Hilda-Rios-Reyes, Carlos Andrés Galán-Vidal, Influence of the Temperature on the Diffusion Coefficient Value during the Cobalt Electrodeposition on Different Substrates. Advanced Materials Research Vol. 976 (2014) pp 144-147.


Abstract


Cobalt electrodeposition on palladium and glassy carbon was studied at different temperatures by using voltammetric techniques. Temperature effect on the diffusion coefficient value was analyzed. The results clearly showed that cobalt electrodeposition is a diffusioncontrolled process. The temperature effect on the values of the diffusion coefficient was analyzed through the Arrhenius equation. The value of the activation energy was calculated as 21.56 kJ mol-1 and 25.73 kJ mol1 for palladium and glassy carbon respectively.



Research Product




Related articles

Underpotential deposition of cobalt onto polycrystalline platinum

Hydrogen bond studies in substituted N-(2-hydroxyphenyl)--2-[(4-methylbenzenesulfonyl)amino]acetamid...

Bioaccumulation and genotoxic damage in zebrafish (Danio rerio) by arsenic in the waters of Zimapán, Hida...

Electrochemical kinetic study about cobalt electrodeposition onto GCE and HOPG substrates from sulfa...

Effect of support composition on the surface structures of nickel oxides and molybdenum and molybdenum oxides....

Predicting the Phase Diagram of a Liquid Crystal Using the Convex Peg Model and the Semiempirical PM...

Analysis of the experimental pressuretemperature behavior in the isotropicnematic phase transition f...

Theoretical and Experimental Study of Cobalt Nucleation and Growth onto Gold Substrate with Differen...

Cobalt electrodeposition onto highly oriented pyrolytic graphite (HOPG) electrode from ammonium sulfide (HOPG) electrode...

Nucleation and growth of cobalt onto different substrates: Part I. Underpotential deposition onto a ...